FOURIER-TRANSFORM INFRARED-ANALYSIS OF HEXAMETHYLDISILOXANE LAYERS OBTAINED IN LOW-FREQUENCY GLOW-DISCHARGE

Polymer layers from hexamethyldisiloxane (HMDSO) up to 1 mum were prod uced by glow discharge at 50 Hz under different polymerization conditi ons. The Fourier transform infrared (FTIR) spectra of such layers were obtained at different current densities of the glow discharge (0.53 t o 3.10 mA/cm2), substrate temperatures from 35 to 125-degrees-C; gaseo us phase pressures from 13.3 to 266 Pa, and layer thicknesses from 0.2 to 0.6 mum. The FTIR spectra of polyhexamethyldisiloxane (PHMDSO) lay ers modified after treatment in ammoniacal plasma were studied. The sp ectra of layers obtained in plasma containing both monomer and ammonia vapors were also analyzed. (C) 1993 John Wiley & Sons, Inc.