R. Bertoncello et al., CHEMICAL INTERACTIONS IN TITANIUM-IMPLANTED AND TUNGSTEN-IMPLANTED FUSED-SILICA, Journal of non-crystalline solids, 162(3), 1993, pp. 205-216
Silica glasses were implanted with titanium at energies of 30 and 190
keV at a dose of 5 x 10(16) CM-2 and with tungsten at 200 keV and dose
of 1.6 x 10(16) CM-2 and 5 x 10(16) CM-2 . A set of titanium- and tun
gsten-implanted samples was also subsequently implanted with nitrogen
in the energy range of 15-100 keV and dose of 2 x 10(17) 17 CM-2. Samp
les were characterized by X-ray photoelectron spectroscopy, secondary
ion mass spectrometry, Rutherford backscattering spectrometry, nuclear
reaction analysis and, partially, IR-diffuse reflectance. Titanium si
licide and titanium oxide compounds were observed in titanium-implante
d samples. Subsequent nitrogen implantation destroys the titanium sili
cide species, inducing the formation of titanium metallic clusters and
substoichiometric silicon nitrides: titanium oxides are transformed t
o titanium oxynitrides. Tungsten implantation causes the formation of
metallic tungsten precipitates and the presence of tungsten oxides was
observed. Nitrogen implantation favours the formation of tungsten oxy
nitrides. Thermodynamic considerations were applied to explain the che
mical interactions between implanted species and substrate.