OPTICAL-EMISSION CHARACTERIZATION OF CH4+H2 DISCHARGES FOR DIAMOND DEPOSITION

Citation
C. Gomezaleixandre et al., OPTICAL-EMISSION CHARACTERIZATION OF CH4+H2 DISCHARGES FOR DIAMOND DEPOSITION, Journal of applied physics, 74(6), 1993, pp. 3752-3757
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
74
Issue
6
Year of publication
1993
Pages
3752 - 3757
Database
ISI
SICI code
0021-8979(1993)74:6<3752:OCOCDF>2.0.ZU;2-U
Abstract
Methane and hydrogen discharges has been studied at different discharg e frequencies (35 kHz, 13.56 MHz, and 2.45 GHz) and feeding gas ratios (up to 100% of methane) during diamond and diamond-like deposition by plasma chemical vapor deposition techniques. Optical emission spectro scopy shows that the intensity of atomic hydrogen line (H(alpha)) is t he highest at the microwave frequency (2.45 GHz). In addition, at this frequency and low methane concentrations (< 7.5%) the emission of CH species is also detected, which has been associated to the presence o f the diamond phase in the films. On the contrary, at the lower freque ncies (35 kHz and 13.56 MHz), the emission spectra are dominated by ne utral CH species that are supposed to be the precursor species in the diamond-like films deposited at these frequencies.