FACILE ABSTRACTION OF CHEMISORBED-D ON SI(100) BY ATOMIC-H

Authors
KOLESKE DD GATES SM SCHULTZ JA
Citation
Dd. Koleske et al., FACILE ABSTRACTION OF CHEMISORBED-D ON SI(100) BY ATOMIC-H, The Journal of chemical physics, 99(7), 1993, pp. 5619-5622
Citations number
30
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
The Journal of chemical physics → ACNP
ISSN journal
00219606
Volume
99
Issue
7
Year of publication
1993
Pages
5619 - 5622
Database
ISI
SICI code
0021-9606(1993)99:7<5619:FAOCOS>2.0.ZU;2-#
Abstract
The abstraction of chemisorbed deuterium (D) on Si(100) by atomic hydr ogen (H(at)) is studied in real time. The surface H and D coverages ar e measured by mass analyzing the recoiled H+ and D+ ion signals during the abstraction reaction. We find that H(at) efficiently removes adso rbed D on Si(100) with a low activation energy of 0.8+/-0.6 kcal/mol a nd a reaction probability that is 0.36 times the H(at) adsorption rate on clean Si(100).