NOBLE-GAS ION-ASSISTED EVAPORATION OF CARBON

Citation
J. Ullmann et al., NOBLE-GAS ION-ASSISTED EVAPORATION OF CARBON, Thin solid films, 232(2), 1993, pp. 154-160
Citations number
23
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
232
Issue
2
Year of publication
1993
Pages
154 - 160
Database
ISI
SICI code
0040-6090(1993)232:2<154:NIEOC>2.0.ZU;2-U
Abstract
Hard, adherent amorphous carbon films were formed by condensation of e vaporated carbon particles with additional noble gas ion bombardment o f the growing film (ion assisted evaporation (IAE)). Ion energy, ion m ass, angle of ion incidence and ion-to-atom arrival rate are the main parameters influencing the film growth. The effects of these parameter s on the resulting structural (electron energy loss spectroscopy and d ensity determination) and mechanical (Vickers hardness measurements) f ilm properties were studied. In addition, a systematic investigation o f the corrosion protection potential of the carbon IAE films was carri ed out. It could be shown that the corrosion protection and the hardne ss of the films are strongly dependent on the angle of ion incidence a nd the ion-to-atom arrival ratio. The latter quantity and the ion ener gy also affect the film density and structure. The experimental result s are discussed in the context of simulations of ion-atom interactions . In general, the depth and volume of the activated region and the amo unt of transferred ion energy to the carbon matrix atoms mainly affect the film growth and the resulting film properties.