CORROSION BEHAVIOR OF VARIOUS TIN THIN-FILMS PRODUCED BY ION MIXING AND PVD METHODS

Authors
YAN PX YANG SZ
Citation
Px. Yan et Sz. Yang, CORROSION BEHAVIOR OF VARIOUS TIN THIN-FILMS PRODUCED BY ION MIXING AND PVD METHODS, Thin solid films, 232(2), 1993, pp. 204-207
Citations number
6
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
232
Issue
2
Year of publication
1993
Pages
204 - 207
Database
ISI
SICI code
0040-6090(1993)232:2<204:CBOVTT>2.0.ZU;2-W
Abstract
The electrochemical behavior of TiN films produced by three different techniques was studied. Anodic polarization tests show that 110 keV N implantation into an iron sample coated with an 80 nm thick Ti layer exhibits excellent corrosion resistance properties in 1N H2SO4 solutio n. On the other hand, 110 keV N+ implantation into a sample coated wit h a 500 nm thick Ti layer gives poor corrosion resistance properties. These results are presented and discussed.