NONISOTHERMAL MICROWAVE PROCESSING OF REACTION-BONDED SILICON-NITRIDE

Citation
Jj. Thomas et al., NONISOTHERMAL MICROWAVE PROCESSING OF REACTION-BONDED SILICON-NITRIDE, Journal of the American Ceramic Society, 76(5), 1993, pp. 1384-1386
Citations number
11
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00027820
Volume
76
Issue
5
Year of publication
1993
Pages
1384 - 1386
Database
ISI
SICI code
0002-7820(1993)76:5<1384:NMPORS>2.0.ZU;2-M
Abstract
The size and density of reaction-bonded silicon nitride (RBSN) specime ns are limited by the reduction in pore size and pore volume associate d with the nitridation reaction. In particular, under conventional hea ting, pores at the surface of dense compacts close before the center h as reacted fully. Microwave heating offers a unique advantage over con ventional heating for the processing of RBSN. A temperature gradient c an be maintained within the compact, which causes the reaction to occu r preferentially in the interior. This increases the amount of silicon converted to Si3N4 because the center of compacts with a high green d ensity finishes reacting before the porosity near the surface closes. This study follows the reaction process and shows that partially nitri ded silicon compacts have composition gradients in the radial directio n. Microwave processing also facilitates control of the reaction rate.