Thin-film technologies lead to low cost and reliable microsystems comb
ining electronics and sensors. However, in competition with microelect
ronic fabrication sensor technologies exhibit a lack of experience cre
ating difficulties in microsystem integration. In this paper a simple
implantation process is introduced to improve thin-film sensor perform
ance. In, Ni and Sb-doped thin-film V and Pt catalysed SnO2 ps sensors
are presented. The sensor response due to pulses of H-2, Co(x), NH3,
NO2, CH, and C2H5OH is discussed in the temperature range between 100
and 400-degrees-C.