30-MW 690-NM HIGH-POWER STRAINED-QUANTUM-WELL ALGAINP LASER
Citation
Y. Ueno et al., 30-MW 690-NM HIGH-POWER STRAINED-QUANTUM-WELL ALGAINP LASER, IEEE journal of quantum electronics, 29(6), 1993, pp. 1851-1856
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
SICI code
0018-9197(1993)29:6<1851:36HSAL>2.0.ZU;2-W
Abstract
This paper presents a high-power 690-nm AlGaInP laser for use in a hig
h-density rewritable-optical-disk memory system. The deterioration of
its temperature characteristics, which results from the high-power-ori
ented laser structure, is improved by using compressively strained GaI
nP quantum wells as the active layer. Output power of 40 mW is achieve
d up to 80-degrees-C. Stable fundamental-transverse-mode operation is
obtained up to 50 mW. Output-power-induced facet degradation is suppre
ssed by an Al2O3 facet coating. The lasers operate stably at 30 mW at
50-degrees-C for over 2600 h. The mean extrapolated lifetime is 10 000
h.