A two-dimensional simulation model of thin-film deposition, which invo
lves the effect of the incident kinetic energy of atoms and the mobili
ty of the substrate temperature, is developed. Lennard-Jones potential
and nuclear scattering are used to characterize the atom-atom interac
tion. The effect of substrate temperature on the relaxation of deposit
ing particles is also considered. Some simulation results are presente
d and discussed in detail.