Special substrate-film designs are used to measure roughness-induced s
cattering and scattering from the volume of optical thin films separat
ely. So theoretical models of surface roughness and volume scattering
become applicable to the experimental data, and quantitative informati
on on thin-film microstructure can be derived. Measuring total integra
ted and angle-resolved scattering on oxide, fluoride, and chalcogenide
films of different film thicknesses yields the evolution law of micro
structural growth, which for the majority of investigated films roughl
y follows a square-root dependence on film thickness. Packing densitie
s of fluoride films calculated from volume-scattering data are found t
o agree with results from quartz-crystal monitoring.