OPTICAL COATINGS DEPOSITED BY REACTIVE ION PLATING

Citation
Aj. Waldorf et al., OPTICAL COATINGS DEPOSITED BY REACTIVE ION PLATING, Applied optics, 32(28), 1993, pp. 5583-5593
Citations number
43
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
32
Issue
28
Year of publication
1993
Pages
5583 - 5593
Database
ISI
SICI code
0003-6935(1993)32:28<5583:OCDBRI>2.0.ZU;2-T
Abstract
The effect of different reactive ion-plating process parameters on the transmittance and the reflectance of single layers of HfO2, Ta2O5, an d SiO2 are investigated. The optical constants obtained for these thre e as-deposited materials are presented. Laser-damage threshold trends are examined on single- and double-layer coatings at 1064 nm and on hi gh-reflectance coatings for 248 nm. Single- and double-cavity filters are constructed for the UV (< 1-nm bandwidth) and near-infrared (50-nm bandwidth) regions, respectively. After the filters are postannealed in air at 375-degrees-C for several hours, a shift in the peak wavelen gths is observed along with a substantial increase in the peak transmi ttance. As expected, no significant wavelength shifts result from chan ges in the humidity of the ambient atmosphere.