EMISSION-SPECTROSCOPY OF REACTIVE LOW-VOLTAGE ION PLATING FOR METAL-OXIDE THIN-FILMS

Authors
ZARRABIAN S LEE C GUENTHER KH
Citation
S. Zarrabian et al., EMISSION-SPECTROSCOPY OF REACTIVE LOW-VOLTAGE ION PLATING FOR METAL-OXIDE THIN-FILMS, Applied optics, 32(28), 1993, pp. 5606-5611
Citations number
27
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
32
Issue
28
Year of publication
1993
Pages
5606 - 5611
Database
ISI
SICI code
0003-6935(1993)32:28<5606:EORLIP>2.0.ZU;2-4
Abstract
Excited species in the plasma present during reactive low-voltage ion plating (RLVIP) of refractory oxide films are studied by using emissio n spectroscopy. We believe we have found a higher ratio of atomic to m olecular oxygen then reported for earlier analyses that employed a qua drupole mass spectrometer. The application of emission spectroscopy to the RLVIP process and self-actinometry are discussed with examples of stable and unstable processes.