Auger electron spectroscopy (AES) has been employed in the study of ov
ergrowth of alpha-SiC (15R) on alpha-SiC (6H). The Auger depth profili
ng revealed the interface between these two polytypes. it is estimated
to be almost-equal-to 0.25 mum wide. An increase in density of disloc
ations, as revealed by chemical etching, was noticed at the interface.
The overgrowth of a polytype on the other is explained as the consequ
ence of cooling conditions.