Rejuvenation of the oxidized Se/GaAs surface has been realized by depo
sition of a thin Al layer. The results provided by synchrotron radiati
on photoelectron spectroscopy show that upon Al deposition, oxygen ori
ginally bound to Ga segregates to the surface and forms a more thermod
ynamically stable Al oxide species. In addition, a reduction in band b
ending is realized suggesting that this method may be useful as a mean
s of fabricating a wide range of passivated overlayer/Se/GaAs interfac
es.