SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASE EPITAXY-GROWN GAAS OBSERVED BY ATOMIC-FORCE MICROSCOPY

Citation
Cc. Hsu et al., SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASE EPITAXY-GROWN GAAS OBSERVED BY ATOMIC-FORCE MICROSCOPY, Applied physics letters, 63(13), 1993, pp. 1839-1841
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
63
Issue
13
Year of publication
1993
Pages
1839 - 1841
Database
ISI
SICI code
0003-6951(1993)63:13<1839:SOMVEG>2.0.ZU;2-Z
Abstract
Steps of monolayer height (0.28 nm) are observed by atomic force micro scope on a metalorganic vapor phase epitaxy grown GaAs surface. Monola yer terrace width was found to be as large as 430 nm, the same as the vicinal substrate surface. The growth mechanism is according to the cl assical Burton-Cabrera-Frank theory. We may have a larger (> 500 nm) t errace width and surface diffusion length if an exactly oriented [100] substrate is used.