The defect properties of rapidly thermally oxidized porous silicon are
studied by electron paramagnetic resonance. Two different types of de
fects can be distinguished. One is very similar to the defects observe
d in damaged crystalline or amorphous Si, whereas the second one is cl
osely related to the P(b), center. A maximum defect density of 8 X 10(
18) cm-3 is observed for samples annealed at about 600-degrees-C. The
intensity of the photoluminescence band at 1.7 eV anticorrelates with
the density of the defects.