MODEL FOR THE VAPORIZATION OF MIXED ORGANOMETALLIC COMPOUNDS IN THE METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF HIGH-TEMPERATURE SUPERCONDUCTING FILMS

Authors
MENG GY ZHOU G SCHNEIDER RL SARMA BK LEVY M
Citation
Gy. Meng et al., MODEL FOR THE VAPORIZATION OF MIXED ORGANOMETALLIC COMPOUNDS IN THE METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF HIGH-TEMPERATURE SUPERCONDUCTING FILMS, Applied physics letters, 63(14), 1993, pp. 1981-1983
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
63
Issue
14
Year of publication
1993
Pages
1981 - 1983
Database
ISI
SICI code
0003-6951(1993)63:14<1981:MFTVOM>2.0.ZU;2-M
Abstract
A model of the vaporization and mass transport of mixed organometallic s from a single source for thin film metalorganic chemical vapor depos ition is presented. A stoichiometric gas phase can be obtained from a mixture of the organometallics in the desired mole ratios, in spite of differences in the volatilities of the individual compounds. Proper f ilm composition and growth rates are obtained by controlling the veloc ity of a carriage containing the organometallics through the heating z one of a vaporizer.