Nucleation control is one of the key questions in quantum dots preparation
and application. This paper reports the experimental results of orthogonal
alignment InAs islands formed on (001) InP substrate by low-pressure metal-
organic chemical vapor deposition. As a nucleation control layer, the tensi
le strained GaAs epilayer with orthogonal trench structure was grown firstl
y on (001) InP substrate under Stranski-Krastanov growth mode. Then, the In
As islands were grown selectively on the trench edges by using strain effec
t. This growth technique results in the formation of orthogonal alignment I
nAs islands without any preprocessing technique prior to the growth.