Disorder effect on the physical properties of Sb-S thin films

Sb-S Films were prepared by thermal evaporation at vacuum of 10(-5) torr an d at the temperature of 300 K. The deposition rate of films was varied from 4 to 121 Angstrom. After the heat treatment the film prepared at R = 34 An gstrom/s showed well defined crystallites while the film prepared at R = 12 1 Angstrom showed many cracks observed all over the film surface. At the hi gher rate of deposition one is close to the stoichiometric compound but tha t is not the main factor affecting the quality of the deposited amorphous t hin film material.