The propagation of the carbon plumes in argon atmosphere used for film grow
th by pulsed laser ablation deposition (PLAD) is studied using ion probe. S
patial and angle resolved analysis of plasma parameters as a function of ar
gon gas pressure is presented. The electron temperature is strongly depende
nt on the angle with target surface normal as well as the distance from the
target surface. The forward directed nature of the PLAD process is strongl
y influenced by the pressure of the ambient gas. The plasma parameters are
used to explain the effect of ambient gas pressure on the characteristics o
f the deposited film.