CHARACTERIZATION OF GAINAS INP TRIPLE-BARRIER RESONANT-TUNNELING DIODES GROWN BY ORGANOMETALLIC VAPOR-PHASE EPITAXY FOR HIGH-TEMPERATURE ESTIMATION OF PHASE COHERENT LENGTH OF ELECTRONS/

Citation
R. Takemura et al., CHARACTERIZATION OF GAINAS INP TRIPLE-BARRIER RESONANT-TUNNELING DIODES GROWN BY ORGANOMETALLIC VAPOR-PHASE EPITAXY FOR HIGH-TEMPERATURE ESTIMATION OF PHASE COHERENT LENGTH OF ELECTRONS/, JPN J A P 1, 36(3B), 1997, pp. 1846-1848
Citations number
10
Categorie Soggetti
Physics, Applied
Volume
36
Issue
3B
Year of publication
1997
Pages
1846 - 1848
Database
ISI
SICI code
Abstract
To estimate the phase coherent length (L(C)) of electrons in semicondu ctor, triple-barrier resonant tunneling diodes (TBRTDs) with GaInAs/In P heterostructures were fabricated by using organo-metallic vapor phas e epitaxy (OMVPE). The current density-voltage (J-V) characteristics w ere measured at 4.2 K and 77 K. Moreover method of comparison between experimental and theoretical results is proposed. By comparing experim ental result with theoretical result, the coherent lengths are estimat ed to be longer than 90 nm and 55 nm at 4.2 K and 77 K respectively.