Transport properties of gated resonant tunneling diodes in the single electron regime

Citation
M. Griebel et al., Transport properties of gated resonant tunneling diodes in the single electron regime, J APPL PHYS, 84(12), 1998, pp. 6718-6724
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
84
Issue
12
Year of publication
1998
Pages
6718 - 6724
Database
ISI
SICI code
0021-8979(199812)84:12<6718:TPOGRT>2.0.ZU;2-A
Abstract
To investigate the transport properties of resonant tunneling diodes with d imensions in the submicron range, small area mesa diodes with surrounding S chottky gates have been processed. The gate turns out to provide excellent current control, which makes a resonant tunneling transistor operation mode feasible for our devices. In the single electron regime very distinct stai rcase-like features are observed in the current voltage characteristics. An accurate analysis of this staircase characteristic by means of magnetotran sport measurements shows that tunneling through defect states can be ruled out as a reason for these current steps. Moreover, we show that the current steps are exclusively due to quantization effects of the gate potential. A t high magnetic fields a saturation-like behavior of the step onset voltage s occurs as a function of a magnetic field applied parallel to the directio n of transport. This effect can be explained by boundary conditions for the electron number and the Fermi level in the electron supply layer next to t he double barrier structure. (C) 1998 American Institute of Physics. [S0021 -8979(98)01224-9].