A. Furuya et Jd. Cuchiaro, Compositional dependence of electrical characteristics of SrBi2(Ta1-xNbx)(2)O-9 thin-film capacitors, J APPL PHYS, 84(12), 1998, pp. 6788-6794
Ferroelectric capacitors using SrBi2(Ta1-xNbx)(2)O-9 (SBTN) were compositio
nally altered varying Nb concentration from 0 to 1, the corresponding I - V
and P - E electrical characteristics evaluated from room temperature to 14
5 degrees C. These temperature evaluations reveal that the leakage current
will increase with larger Nb concentration and the dominant conduction mech
anism changes from Schottky to Frenkel-Poole emission. The ferroelectric hy
steresis curve shifts in the direction of negative polarization as the temp
erature or the concentration of Nb increases. Concentration increases in Nb
reduces the temperature dependence of remnant polarization and coercive fi
eld. Film resistance to imprint and degradation from elevated temperature i
mproves. Substituting b-site Nb for Ta allows imprinted capacitors to recov
er by application of either bipolar fatigue pulses at room temperature (RT)
or, cycling P - E measurement pulses at elevated temperature. Due to this
asymmetrical tradeoff of film ferroelectric properties, there is an optimum
identifiable range of Nb concentrations (0.25-0.5) capable of achieving me
mory performance. Optimized SBTN ferroelectric films will suitably perform
in integrated circuit memory function applications provided that the leakag
e current incurred at higher Nb concentrations can be reduced. (C) 1998 Ame
rican Institute of Physics. [S0021-8979(98)05724-7].