Site selectivity in the deposition and redeposition of polystyrene particles to glass

Citation
Pj. Wit et Hj. Busscher, Site selectivity in the deposition and redeposition of polystyrene particles to glass, J COLL I SC, 208(1), 1998, pp. 351-352
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF COLLOID AND INTERFACE SCIENCE
ISSN journal
00219797 → ACNP
Volume
208
Issue
1
Year of publication
1998
Pages
351 - 352
Database
ISI
SICI code
0021-9797(199812)208:1<351:SSITDA>2.0.ZU;2-S
Abstract
The site selectivity in the deposition and redeposition of negatively charg ed, polystyrene particles to a glass collector surface was studied under fl ow, by first depositing particles to the collector surface and then removin g them by passing of an air-liquid interface. Using an image analysis syste m, the coordinates of the occupied sites were memorized and subsequently th e probability of redeposition on these sites relative to deposition on othe r collector surface areas was determined. In low ionic strength buffers, 20 and 30 mM KNO3, redeposition probabilities on previously occupied sites we re up to 51 times higher than for deposition elsewhere, while in high ionic strengths buffers (above 30 mM) redeposition probabilities were essentiall y similar as for deposition on other collector surface sites. It is suggest ed that high affinity sites for particle deposition exist on glass, on whic h preferential (re)deposition is mediated through attractive electrostatic interactions. Although such a suggestion is not new, this is the first time supporting evidence has been collected through redeposition experiments as described here, (C) 1998 Academic Press.