Characterization of CdTe, Cd0.96Zn0.04 and Zn-diffused CdTe by defect etching

Citation
Jc. Clark et al., Characterization of CdTe, Cd0.96Zn0.04 and Zn-diffused CdTe by defect etching, J MAT S-M E, 9(5), 1998, pp. 397-401
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN journal
09574522 → ACNP
Volume
9
Issue
5
Year of publication
1998
Pages
397 - 401
Database
ISI
SICI code
0957-4522(199810)9:5<397:COCCAZ>2.0.ZU;2-V
Abstract
The crystal quality of CdTe, Cd0.96Zn0.04Te and Zn-diffused CdTe slices con taining 1 x 10(22) cm(-3) atoms of zinc at the surface of the slice was inv estigated by the technique of defect etching. In this investigation, the ch emical etch. Inoue EAg-1 reagent, gave satisfactory results, with useful co mparative values of the etch pit density obtained in these materials. The m ain result that was obtained was that the etch pit density in Zn-diffused C dTe was more than in times greater than in undiffused CdTe and that after t he diffused layer had been removed the value was virtually the same as in u ndiffused CdTe. (C) 1998 Kluwer Academic Publishers.