Sputter deposition of tungsten trioxide for gas sensing applications

Citation
M. Di Giulio et al., Sputter deposition of tungsten trioxide for gas sensing applications, J MAT S-M E, 9(4), 1998, pp. 317-322
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN journal
09574522 → ACNP
Volume
9
Issue
4
Year of publication
1998
Pages
317 - 322
Database
ISI
SICI code
0957-4522(199808)9:4<317:SDOTTF>2.0.ZU;2-9
Abstract
Tungsten trioxide thin films were grown by reactively sputtering a circular WO3 target in different Ar-O-2 atmospheres. After deposition, data an the structural, optical and electrical properties were obtained by using transm ission electron microscopy (TEM) to examine the structure and the morpholog y of the films, UV-VIS spectrophotometry to determine optical absorption ed ge characteristics, and Hall effect measurements to determine the change ca rrier mobility and the film resistivity. In addition, the film resistance v ariations in controlled atmospheres were examined and the gas sensing prope rties of films grown under different conditions were compared. The aim of t he study was to examine the effect of O-2 concentration in the sputtering a tmosphere on structural, optical, electrical and sensing properties. (C) 19 98 Kluwer Academic Publishers.