Molecular dynamics evaluation of self-sputtering of beryllium

Citation
S. Ueda et al., Molecular dynamics evaluation of self-sputtering of beryllium, J NUCL MAT, 263, 1998, pp. 713-718
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
JOURNAL OF NUCLEAR MATERIALS
ISSN journal
00223115 → ACNP
Volume
263
Year of publication
1998
Part
A
Pages
713 - 718
Database
ISI
SICI code
0022-3115(199810)263:<713:MDEOSO>2.0.ZU;2-R
Abstract
The self-sputtering of Be was simulated by a molecular dynamics (MD) approa ch with the use of a newly developed 2-body Be potential. Incident angle de pendence of the sputtering yield was evaluated for the incident particle en ergies of 50, 100, and 300 eV with respect to the (0 0 1) and (0 1 0) surfa ces of the hcp crystal. The calculated sputtering yields are in good agreem ent with both experimental estimates and the TRIM.SP evaluations. Small but distinct dependence on the surface type is observed. The calculated reflec tion coefficient become at grazing angles significantly larger than the TRI M.SP evaluation. (C) 1998 Elsevier Science B.V. All rights reserved.