An ultrahigh vacuum sputter source for in situ deposition of size-selectedclusters: Ag on graphite

Citation
Mh. Schaffner et al., An ultrahigh vacuum sputter source for in situ deposition of size-selectedclusters: Ag on graphite, J PHYS D, 31(22), 1998, pp. 3177-3184
Citations number
62
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
31
Issue
22
Year of publication
1998
Pages
3177 - 3184
Database
ISI
SICI code
0022-3727(19981121)31:22<3177:AUVSSF>2.0.ZU;2-J
Abstract
The investigation of supported size-selected clusters by different surface science techniques requires stringent ultrahigh vacuum (UHV) conditions dur ing cluster deposition especially at low temperatures. The existing high-en ergy sputter sources used for cluster production in general do not fulfil t his demand. We therefore have developed, built and tested a new fully bakea ble ultrahigh vacuum-compatible version of the cluster source CORDIS (Cold Reflex Discharge ion Source). As a first application, we present ultraviole t photoemission spectra (UPS) of size-selected Ag, (n = 1...5) clusters gen erated by this new cluster source and deposited on highly oriented pyrolyti c graphite (HOPG). We show evidence for cluster diffusion and island format ion even down to low temperature (T = 70 K). These islands display a polycr ystalline structure. After a short annealing, they are transformed into Ag films with (111) surface orientation.