A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261, 1998)

Authors
Seino, H Mochizuki, A Haba, O Ueda, M
Citation
H. Seino et al., A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261, 1998), J POL SC PC, 36(17), 1998, pp. 3197-3197
Citations number
1
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY
ISSN journal
0887624X → ACNP
Volume
36
Issue
17
Year of publication
1998
Pages
3197 - 3197
Database
ISI
SICI code
0887-624X(199812)36:17<3197:APPAPW>2.0.ZU;2-G