Characterization of Pt electrodes for ferroelectric thin films prepared bymetallorganic chemical vapor deposition using Pt(CF3COCHCOCF3)(2) and (CH3C5H4)Pt(CH3)(3)

Authors
Lee, JM Hong, SK Hwang, CS Kim, HJ Suk, CG
Citation
Jm. Lee et al., Characterization of Pt electrodes for ferroelectric thin films prepared bymetallorganic chemical vapor deposition using Pt(CF3COCHCOCF3)(2) and (CH3C5H4)Pt(CH3)(3), J KOR PHYS, 33, 1998, pp. S148-S151
Citations number
9
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
ISSN journal
03744884 → ACNP
Volume
33
Year of publication
1998
Supplement
S
Pages
S148 - S151
Database
ISI
SICI code
0374-4884(199811)33:<S148:COPEFF>2.0.ZU;2-1
Abstract
Pt thin films were deposited by metallorganic chemical vapor deposition for the application for electrodes of ferroelectric thin films. Pt thin films with smooth surface morphology and good electrical conductivity were deposi ted using Pt(CF3COCHCOCF3)(2) as a source precursor by conventional bubbler system. Pb(Zr, Ti)O-3 thin films on Pt electrodes, deposited by MOCVD, had well-developed microstructure and showed excellent P-E hysteresis curves. High quality Pt thin films could also be obtained using (CB3C5H4)Pt(CH3)(3) solution by direct liquid injection system.