Localized excitons in InxGa1-xN/GaN quantum well structure

Citation
My. Ryu et al., Localized excitons in InxGa1-xN/GaN quantum well structure, J KOR PHYS, 33, 1998, pp. S316-S318
Citations number
7
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
ISSN journal
03744884 → ACNP
Volume
33
Year of publication
1998
Supplement
S
Pages
S316 - S318
Database
ISI
SICI code
0374-4884(199811)33:<S316:LEIIQW>2.0.ZU;2-1
Abstract
Photoluminescence (PL) and photoreflectance (PR) have been employed to stud y the optical transitions of InxGa1-xN/GaN quantum well (QW) structures gro wn by metal-organic chemical vapor deposition (MOCVD). The main PL peak at 2.895 eV is attributed to the excitons localized at trap centers, which ori ginate from the In-rich region within the well. Several emission bands on b oth sides of the main peak are attributed to the interference fringe effect s and the recombination of excitons localized at several levels in the In0. 183Ga0.817 N well. The PL peak at 3.040 eV is ascribed to the lowest n=1 qu antized transition which agrees well with the calculated result.