We have demonstrated that an exposed AlAs layer can be seated against furth
er wet oxidation and an 8x8 vertical-cavity surface-emitting laser (VCSEL)
array was fabricated using the sealing technique. A critical processing ste
p consists of the formation of an oxide surface barrier by the first wet ox
idation for a short time at 390 similar to 430 degrees C in steam environme
nt of previously roam ambient exposed AlAs surface. The best optimum condit
ion for sealing AlAs was to form the oxide surface barrier with a thickness
of similar to 1 mu m at 408 degrees C for 15 s. Then the buried AlAs layer
s were protected against further wet oxidation at 400 degrees C for one hou
r. The threshold current of an 8 x 8 VCSEL array ranged from 0.2 to 1.5 mA.
This laser array had an average threshold current of 0.46 mA and a standar
d deviation of 0.26 mA. The thermal resistance of an element of the array w
as about 1.82 degrees C/mW.