A. Yoshioka et al., Stabilization of resistive wall mode due to shear Alfven resonance in a cylindrical plasma with a uniform longitudinal flow, J PHYS JPN, 67(11), 1998, pp. 3794-3800
Resistive wall mode (RWM) is studied in a cylindrical plasma with a uniform
longitudinal plasma flow. In order to simplify the analysis, two steps cur
rent profile model is employed with a constant current density j(0) for the
inner region 0 less than or equal to r less than or equal to a(0) and a co
nstant current density j(1) for the outer region a(0) less than or equal to
r less than or equal to a. Also the resistive shell is assumed sufficientl
y thin. Current profiles from peaked ones to hollow ones are simulated by c
hanging the ratio j(1)/j(0). Based on the incompressible MHD model, it is s
hown that RWM can he stabilized by adjusting the resistive wall position, w
hen the shear Alfven resonance appears inside the plasma column, with the i
ncrease of the uniform flow velocity. In this case the free energy destabil
izing the RWM is absorbed in the plasma column through the shear Alfven res
onance. However, except when the RWM is close to the marginal state without
a plasma flow, the flow velocity for stabilization is comparable to the so
und velocity.