Stabilization of resistive wall mode due to shear Alfven resonance in a cylindrical plasma with a uniform longitudinal flow

Citation
A. Yoshioka et al., Stabilization of resistive wall mode due to shear Alfven resonance in a cylindrical plasma with a uniform longitudinal flow, J PHYS JPN, 67(11), 1998, pp. 3794-3800
Citations number
18
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
ISSN journal
00319015 → ACNP
Volume
67
Issue
11
Year of publication
1998
Pages
3794 - 3800
Database
ISI
SICI code
0031-9015(199811)67:11<3794:SORWMD>2.0.ZU;2-4
Abstract
Resistive wall mode (RWM) is studied in a cylindrical plasma with a uniform longitudinal plasma flow. In order to simplify the analysis, two steps cur rent profile model is employed with a constant current density j(0) for the inner region 0 less than or equal to r less than or equal to a(0) and a co nstant current density j(1) for the outer region a(0) less than or equal to r less than or equal to a. Also the resistive shell is assumed sufficientl y thin. Current profiles from peaked ones to hollow ones are simulated by c hanging the ratio j(1)/j(0). Based on the incompressible MHD model, it is s hown that RWM can he stabilized by adjusting the resistive wall position, w hen the shear Alfven resonance appears inside the plasma column, with the i ncrease of the uniform flow velocity. In this case the free energy destabil izing the RWM is absorbed in the plasma column through the shear Alfven res onance. However, except when the RWM is close to the marginal state without a plasma flow, the flow velocity for stabilization is comparable to the so und velocity.