M. Leroux et al., Quantum confined Stark effect due to built-in internal polarization fieldsin (Al,Ga)N/GaN quantum wells, PHYS REV B, 58(20), 1998, pp. R13371-R13374
(Al,Ga)N/GaN quantum wells have been studied by temperature-dependent lumin
escence and reflectivity. The samples were grown by molecular beam epitaxy
on (0001) sapphire substrates, and well widths were varied from 3 to 15 mon
olayers (ML's) with a 2-ML increment, thus providing a reliable data set fo
r the study of the well width dependence of transition energies. The latter
shows a strong quantum confined Stark effect for wide wells, and an intern
al electric-field strength of 450 kV/cm is deduced. X-ray diffraction perfo
rmed on the same samples shows that the GaN layers are nearly unstrained, w
hereas the (AI,Ga)N barriers are pseudomorphically strained on GaN. We conc
lude that the origin of the electric field is predominently due to spontane
ous polarization effects rather than a piezoelectric effect in the well mat
erial. [S0163-1829(98)50944-7].