An n-body potential for the Ni-Mo system is constructed based on the Finnis
-Sinclair formalism by using the physical properties obtained from first-pr
inciple calculations. Employing the potential, a molecular-dynamics simulat
ion is performed to reveal the amorphization process in the Ni-Mo multilaye
rs upon annealing at medium temperatures ranging from 300 to 600 degrees C.
Six sandwich models consisting of atomic planes with various orientations
and one bilayer model are simulated to investigate the effect of interfacia
l texture on amorphization and the related growth kinetics. It is found tha
t when the sandwich model has a semicoherent interface consisting of both N
i and Mo close-packed planes, amorphization is frustrated even up to a temp
erature of 600 degrees C. Simulation results show that in all the other mod
els with or without a preset disordered interlayer, amorphization can take
place at a temperature down to 350 degrees C and is initiated through a cro
ssing-interface atomic diffusion, diffusion-induced alloying and subsequent
growth of the interfacial amorphous layer, resulting eventually in forming
a uniform amorphous phase. Concerning the kinetics, the growth of the amor
phous layer is found to follow exactly a t(1/2) law, indicating that solid-
state amorphization is indeed through a diffusion-limited reaction. In addi
tion, an asymmetric behavior is observed that the growing speed towards Ni
is greater than that directed to the Mo lattice. [S0163-1829(98)03744-8].