Molecular-dynamics studies on defect-formation processes during crystal growth of silicon from melt

Citation
M. Ishimaru et al., Molecular-dynamics studies on defect-formation processes during crystal growth of silicon from melt, PHYS REV B, 58(19), 1998, pp. 12583-12586
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
58
Issue
19
Year of publication
1998
Pages
12583 - 12586
Database
ISI
SICI code
0163-1829(19981115)58:19<12583:MSODPD>2.0.ZU;2-O
Abstract
We have performed molecular-dynamics calculations to examine defect-formati on processes in silicon grown from the melt based on the ordinary Langevin equation employing the Tersoff interatomic potential. Our simulations indic ated that hexagonal structures are formed near the solid-liquid interfaces and these regions give rise to microfacets composed of primarily {111} plan es. Most of these hexagonal configurations were annihilated during further crystal growth, but a part of them were left, which resulted in defect form ation with five- and seven-member rings. [S0163-1829(98)09943-3].