Computer simulation of multicomponent ion beam enhanced deposition of (TiMo) N films

A Monte Carlo computer simulation code has been developed to describe the b ehavior of incident particles and the growth of (TiMo) N films in the multi component ion beam enhanced deposition process, which combines bombardment with a multicomponent ion beam of N+ + Mo+ and sputter deposition of a Ti f ilm. The him composition profile and intermixed layer between the substrate and the film were studied using a computer simulation method. It is shown that Mo ion implantation has a stronger mixing effect in the film-substrate interface than does N ion implantation. The N profile of the computer simu lation conforms to that of the Auger electron spectroscopy results. (C) 199 8 Elsevier Science S.A. All rights reserved.