An in situ ex situ X-ray analysis system for thin sputtered films

An in situ X-ray analysis system for thin sputtered films was developed. Th is set-up was designed to perform reflectivity, grazing incidence X-ray sca ttering, and texture analysis experiments on films as they are deposited. B eam alignment was facilitated by mounting a rotating anode tube tower on a goniometer which allowed both translation and rotation. The X-ray source co uld then be aligned with either a standard four-circle goniometer (ex situ) or a diffractometer designed around a high-vacuum sputter deposition syste m (in situ). Custom designed UHV beryllium windows allowed X-rays to enter and exit the sputter chamber. An Inel(R) curvilinear position sensitive X-r ay detector capable of rapidly and simultaneously collecting diffracted int ensities through a 90 degrees range with a resolution of similar to 0.02 de grees was used. To test system performance, Mo sputter depositions were stu died. Diffraction patterns were collected in as little as 2 s. This data ca n provide information concerning grain size, texture, and strain evolution which are free of the distortions associated with deposition interruption, thermal fluctuation, and surface oxide formation. (C) 1998 Elsevier Science S.A. All rights reserved.