Atomic transport in Cu/Ge and Co/Ge systems during ion-beam mixing

Citation
S. Dhar et Vn. Kulkarni, Atomic transport in Cu/Ge and Co/Ge systems during ion-beam mixing, THIN SOL FI, 333(1-2), 1998, pp. 20-24
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
333
Issue
1-2
Year of publication
1998
Pages
20 - 24
Database
ISI
SICI code
0040-6090(19981123)333:1-2<20:ATICAC>2.0.ZU;2-0
Abstract
This paper reports on the atomic transport occurring across the interface o f Cu/Ge and Co/Ge layers leading to the synthesis of Cu3Ge and Co2Ge phases under MeV Kr and Ar ion irradiations. These phases have potential applicat ions in modern semiconductor device technology. The marker experiments show that in the case of Cu/Ge systems both Cu and Ge are mobile but Cu is the dominant moving species. On the other hand, in the case of the Co/Ge system only Ge atoms are mobile. The atomic movements during ion irradiation in t hese two systems have been explained on the basis of distribution of defect density and effects of thermodynamic forces. (C) 1998 Elsevier Science S.A . All rights reserved.