A chemical vapour deposition route to MoO3-Bi2O3 thin films

Authors
Barreca, D Rizzi, GA Tondello, E
Citation
D. Barreca et al., A chemical vapour deposition route to MoO3-Bi2O3 thin films, THIN SOL FI, 333(1-2), 1998, pp. 35-40
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
333
Issue
1-2
Year of publication
1998
Pages
35 - 40
Database
ISI
SICI code
0040-6090(19981123)333:1-2<35:ACVDRT>2.0.ZU;2-X
Abstract
MoO3-Bi2O3 thin films are grown by CVD on SiO2/Si(100) and Al2O3 using BiPh 3 and MoO2(dpm)(2) as precursors. The composition, microstructure and morph ology of the samples can be suitably controlled by the proper combination o f synthesis and thermal treatment conditions. The chemical characterization of the obtained films is carried out by XPS and FTIR, while the microstruc ture and surface morphology are investigated respectively by XRD and AFM. P reliminary measurements on Bi-doped MoO3 films indicate that they could be used for the detection of scarcely reducing gases. (C) Published by 1998 El sevier Science S.A. All rights reserved.