The zero-bias capacitance of a Schottky diode formed on a nominally undoped
In0.08Ga0.92As0.51P0.49 is found to be persistently increased after a high
current injection at low temperatures. The increment of capacitance grows
as the amplitude or duration of the current pulse is increased. When a high
current is injected at low temperatures before the deep level transient sp
ectroscopy measurements, the concentration of the so-called ET1 defects is
decreased. It is discussed that all these results are related to the hole i
njection from the Schottky contact and the charge-state controlled stabilit
y of the ET1 defects. (C) 1998 American Institute of Physics. [S0003-6951(9
8)04749-4].