Study of repetitive plasma opening switch generator technology

Citation
Gi. Dolgachev et al., Study of repetitive plasma opening switch generator technology, IEEE PLAS S, 26(5), 1998, pp. 1410-1419
Citations number
19
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
26
Issue
5
Year of publication
1998
Pages
1410 - 1419
Database
ISI
SICI code
0093-3813(199810)26:5<1410:SORPOS>2.0.ZU;2-Z
Abstract
Repetitive plasma opening switch (POS) research for X-ray and electron beam generators for commercial applications is reviewed. This research was star ted on the RS-20 generator in 1991 with submicrosecond conduction times, 10 0 kA currents, and MV voltages. In the experiments wall-plug to electron be am production efficiency was increased from 10-50%. Maximum voltage obtaine d at POS was 3 MV starting from 0.8 MV at the Marx generator, POS operation was improved using an applied external magnetic field for the opening phas e. Diode current and total generator efficiency were increased by combining the POS and diode system in one technology unit. For the opening phase of the high-impedance, repetitive POS, a set of conditions based on early POS experiments in the Kurchatov Institute were proposed. Repetitive POS genera tors hare obtained peak,X-ray dose rates of 1 MGy/s and electron dose rates of 10 GGy/s, This may be important for applications as pulsed irradiation may cause more efficient sterilization at lower doses. An X-ray generator b ased on repetitive POS technology at 5 MV and 200 kW in the electron beam i s proposed.