S. Martinet et al., Modelling of cyclic voltammograms for two-step metal deposition on an inert electrode with adsorption, J APPL ELEC, 28(8), 1998, pp. 819-825
Chromium deposition on an inert electrode is a complex process. To gain a b
etter understanding of phenomena involved in multistep reactions we have st
udied such a mechanism and developed Voltasim, a new software that simulate
s cyclic voltammograms for a two-step metal deposition with adsorption. In
addition, Voltasim is suitable for either reversible or quasi-reversible or
irreversible reactions. The software was validated with experimental resul
ts obtained for the chromium deposition case. Data fitting was achieved usi
ng a screening design of experiments involving 12 parameters.