Modelling of cyclic voltammograms for two-step metal deposition on an inert electrode with adsorption

Citation
S. Martinet et al., Modelling of cyclic voltammograms for two-step metal deposition on an inert electrode with adsorption, J APPL ELEC, 28(8), 1998, pp. 819-825
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF APPLIED ELECTROCHEMISTRY
ISSN journal
0021891X → ACNP
Volume
28
Issue
8
Year of publication
1998
Pages
819 - 825
Database
ISI
SICI code
0021-891X(199808)28:8<819:MOCVFT>2.0.ZU;2-7
Abstract
Chromium deposition on an inert electrode is a complex process. To gain a b etter understanding of phenomena involved in multistep reactions we have st udied such a mechanism and developed Voltasim, a new software that simulate s cyclic voltammograms for a two-step metal deposition with adsorption. In addition, Voltasim is suitable for either reversible or quasi-reversible or irreversible reactions. The software was validated with experimental resul ts obtained for the chromium deposition case. Data fitting was achieved usi ng a screening design of experiments involving 12 parameters.