Laser-induced back ablation of aluminum thin films using picosecond laser pulses

Citation
Ab. Bullock et Pr. Bolton, Laser-induced back ablation of aluminum thin films using picosecond laser pulses, J APPL PHYS, 85(1), 1999, pp. 460-465
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
1
Year of publication
1999
Pages
460 - 465
Database
ISI
SICI code
0021-8979(19990101)85:1<460:LBAOAT>2.0.ZU;2-C
Abstract
A study of laser-induced back ablation of aluminum thin film targets with p icosecond laser pulses is reported. Ablated plume edge velocities are studi ed as a function of film thickness, laser pulse width, and incident laser f luence. Edge velocity results are compared to a model of total transmitted fluence incident at the substrate/film interface. A model including laser-i nduced avalanche ionization and multiphoton ionization mechanisms in the su bstrate shows a transmitted fluence limit which is consistent with observed edge velocity limits. (C) 1999 American Institute of Physics. [S0021-8979( 98)01824- 6].