MICROFILAMENTATION IN OPTICAL-FIELD-INDUCED IONIZATION PROCESS

Citation
Vb. Gildenburg et al., MICROFILAMENTATION IN OPTICAL-FIELD-INDUCED IONIZATION PROCESS, Physical review letters, 78(15), 1997, pp. 2968-2971
Citations number
15
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
78
Issue
15
Year of publication
1997
Pages
2968 - 2971
Database
ISI
SICI code
0031-9007(1997)78:15<2968:MIOIP>2.0.ZU;2-0
Abstract
A plasma-resonance field-ionization instability of uniform gas breakdo wn produced by intense laser fields via tunneling ionization of atoms is studied theoretically and by computer simulation. The field amplitu de and produced plasma are found to be unstable relative to spatial mo dulation in the direction of electric field with the spatial period sh orter than the wavelength. In a dense gas the process, at the nonlinea r stage of instability, becomes explosive and leads to the formation o f thin resonance layers and sharp peaks of the field amplitude.