M. Pedersen et al., High-performance condenser microphone with fully integrated CMOS amplifierand DC-DC voltage converter, J MICROEL S, 7(4), 1998, pp. 387-394
The development of a capacitive microphone with an integrated detection cir
cuit is described. The condenser microphone is made by micromachining of po
lyimide on silicon. Therefore, the structure can be realized by postprocess
ing on substrates containing integrated circuits (IC's), independently of t
he IC process. Integrated microphones with excellent performances have been
realized on a CMOS substrate containing dc-dc voltage converters and pream
plifiers. The measured sensitivity of the integrated condenser microphone w
as 10 mV/Pa, and the equivalent noise level (ENL) was 27 dB(A) re, 20 mu Pa
for a power supply voltage of 1.9 V, which was measured with no bias volta
ge applied to the microphone. Furthermore, a back chamber of infinite volum
e was used in all reported measurements and simulations. [338].