Atomically flat gold film surfaces deposited on Si (111) surfaces at room temperature

Authors
Okamoto, H Nejo, H
Citation
H. Okamoto et H. Nejo, Atomically flat gold film surfaces deposited on Si (111) surfaces at room temperature, J VAC SCI B, 16(6), 1998, pp. 3013-3014
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3013 - 3014
Database
ISI
SICI code
1071-1023(199811/12)16:6<3013:AFGFSD>2.0.ZU;2-W
Abstract
We have observed atomically flat gold surfaces deposited on Si (lll) 7x7 su rfaces. These films are deposited by conventional evaporative deposition at a pressure below 2 X 10(-6) Pa. The surface topography was taken by scanni ng tunneling microscopy. Atomically flat terraces as large as 100 Angstrom separated by steps were observed. This surface should provide a good substr ate for scanning tunneling microscopy studies. (C) 1998 American Vacuum Soc iety. [S0734-211X(98)05806-5].