Citation
T. Takeda et M. Saka, Evaluation of development speed of a photoresist by means of electrical conductivity measurement, J VAC SCI B, 16(6), 1998, pp. 3055-3058
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023
→ ACNP
Volume
16
Issue
6
Year of publication
1998
Pages
3055 - 3058
Database
ISI
SICI code
1071-1023(199811/12)16:6<3055:EODSOA>2.0.ZU;2-1
Abstract
A method was examined for evaluating the electrical conductivity of a photo
resist to predict its development speed. The conductivity of organic soluti
ons of the photoresist base polymer at various frequencies was found to hav
e a positive correlation with the dissolution speed of the photoresist base
polymer into an alkaline developer. In addition, the influence of the meas
urement temperature and of the concentration of the polymer solution on the
conductivity was investigated. It is shown that a prediction of developmen
t speed of a photoresist by measuring its conductivity is possible. (C) 199
8 American Vacuum Society. [S0734-211X(98)00206-6].