F. Hirose et H. Sakamoto, Kinetics of Si growth by an electron-beam-irradiation technique using a Si2H6 source, J VAC SCI B, 16(6), 1998, pp. 3364-3366
Room-temperature selective Si growth is possible by irradiating an electron
beam on a Si surface in a Si2H6 ambient. The growth has an apparent substr
ate temperature dependence, such that the selective growth of Si is allowed
at substrate temperatures only below 330 degrees C. We have found by the H
-2 thermal desorption experiments that the Si surface during the growth is
covered with higher Si hydrides such as: SiH2, SiH3, and Si2H6 molecules. T
his indicates that the selective Si growth is caused by the higher Si hydri
des. The reaction schemes of the Si growth are discussed in this article. (
C) 1998 American Vacuum Society.